Title Titel
Thin Solid Films
 
e-ISSN
1879-2731
 
ISSN
0040-6090
 
Publisher Herausgeber
ELSEVIER SCIENCE SA
 
Publisher's Address Herausgeber Adresse
PO BOX 564, LAUSANNE, SWITZERLAND, 1001
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Date Issued:  [2000 TO 2024]
Date Issued:  [2000 TO 2009]

Results 1-12 of 12 (Search time: 0.003 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Badisch, E. ; Mitterer, C ; Mayrhofer, P.H. ; Mori, G. ; Bakker, R.J. ; Brenner, Josef ; Störi, Herbert Characterization of tribo-layers on self-lubricating PACVD TiN coatingsArtikel Article2004
2Schmid, U. ; Seidel, H. Effect of High Temperature Annealing on the Electrical Performance of Titanium/Platinum Thin FilmsArtikel Article2008
3Schmid, U. ; Seidel, H. Effect of Substrate Properties and Thermal Annealing on the Resistivity of Molybdenum Thin FilmsArtikel Article2005
4Lazar, Petr ; Rashkova, Boriana ; Redinger, Josef ; Podloucky, Raimund ; Mitterer, Christian ; Scheu, Christina ; Dehm, Gerhard Interface structure of epitaxial (111) VN films on (111) MgO substratesArtikel Article 2008
5Eisenmenger-Sittner, Christoph ; Bangert, Herwig ; Joo, Hyun Youn ; Barna, Peter B. ; Kovács, A. Lamellar growth in sputter-deposited aluminum-tin-aluminum sandwich layersArtikel Article2005
6Gall, S. ; Schneider, J. ; Klein, J. ; Hübener, K. ; Muske, M. ; Rau, B. ; Conrad, E. ; Sieber, I. ; Petter, K. ; Lips, K. ; Stöger-Pollach, M. ; Schattschneider, P. ; Fuhs, W. Large-grained polycrystalline silicon on glass for thin-film solar cellsArtikel Article2006
7Bethge, Ole ; Abermann, Stephan ; Henkel, Christoph ; Bertagnolli, Emmerich Low temperature atomic layer deposition of high-k dielectric stacks for scaled metal-oxide-semiconductor devicesArtikel Article2009
8Koch, T. ; Evaristo, M. ; Pauschitz, A. ; Roy, Manish ; Cavaleiro, A. Nanoindentation and nanoscratch behaviour of reactive sputtered deposited W-S-C filmArtikel Article2009
9Mathur, Sanjay ; Sivakov, Vladimir ; Shen, H. ; Barth, Sven Christian ; Cavelius, Christian ; Nilsson, Andreas ; Kuhn, Patrick Nanostructured films of iron, tin and titanium oxides by chemical vapour depositionArtikel Article 28-Apr-2006
10Stöger-Pollach, M. ; Walter, T. ; Muske, M. ; Gall, S. ; Schattschneider, P. Phase transformations of an alumina membrane and its influence on silicon nucleation during the aluminium induced layer exchangeArtikel Article2007
11Stöger-Pollach, Michael ; Walter, Thomas ; Muske, M ; Gall, S ; Schattschneider, Peter Phase transformations of an alumina membrane and its influence on silicon nucleation during the aluminium induced layer exchangeArtikel Article2007
12Grosser, M. ; Schmid, U. The impact of sputter conditions on the microstructure and on the resistivity of tantalum thin filmsArtikel Article 2009