Hochleitner, G

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Hochleitner, G
 

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PreviewAuthors / EditorsTitleTypeIssue Date
1Roediger, P ; Wanzenboeck, H D ; Waid, S ; Hochleitner, G ; Bertagnolli, E Focused-ion-beam-inflicted surface amorphization and gallium implantation-new insights and removal by focused-electron-beam-induced etchingArtikel Article2011
2Burchhart, T ; Zeiner, C ; Hyun, Y J ; Lugstein, A ; Hochleitner, G ; Bertagnolli, E High performance Ω-gated Ge nanowire MOSFET with quasi-metallic source/drain contactsArtikel Article2010
3Roediger, P ; Hochleitner, G ; Bertagnolli, E ; Wanzenboeck, H D ; Buehler, W Focused electron beam induced etching of silicon using chlorineArtikel Article2010