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Record link: 
http://hdl.handle.net/20.500.12708/142898
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Title: 
Electron Beam Lithography for contacting single nanowires on non-flat suspended substrates
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Citation: 
Samà, J., Domènech-Gil, G., Gràcia, I., Borrisé, X., Cané, C., Barth, S., Steib, F., Waag, A., Prades, J. D., & Romano-Rodríguez, A. (2019). Electron Beam Lithography for contacting single nanowires on non-flat suspended substrates. Sensors and Actuators B: Chemical, 286, 616–623. https://doi.org/10.1016/j.snb.2019.01.040
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Publisher DOI: 
10.1016/j.snb.2019.01.040
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Publication Type: 
Article - Original Research Article
en
Authors: 
Samà, Jordi 
Domènech-Gil, Guillem 
Gràcia, Isabel 
Borrisé, Xavier 
Cané, Carles 
Barth, Sven 
Steib, Frederik 
Waag, Andreas 
Prades, Juan Daniel 
Romano-Rodríguez, Albert 
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Organisational Unit: 
E165-02 - Forschungsbereich Molekulare Materialchemie 
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Journal: 
Sensors and Actuators B: Chemical 
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ISSN: 
0925-4005
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Date (published): 
2019
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Number of Pages: 
8
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Peer reviewed: 
Yes
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Keywords: 
Electrical and Electronic Engineering; Condensed Matter Physics; Electronic, Optical and Magnetic Materials; Instrumentation; Surfaces, Coatings and Films; Materials Chemistry; Metals and Alloys; Gas sensor; Individual nanowire; Metal oxide; EBL fabrication; Microhotplates
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Abstract: 
A methodology based on the use of Electron Beam Lithography for contacting individual nanowires on top of non-flat micromembranes and microhotplates has been implemented, and the practical details have been exhaustively described. The different fabrication steps have been adapted to the substrate's topology, requiring specific holders and conditions. The methodology is demonstrated on individual S...
en
Research Areas: 
Structure-Property Relationship: 50%
Materials Characterization: 25%
Surfaces and Interfaces: 25%
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Science Branch: 
Chemie
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Appears in Collections:
Article

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