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Guzzinati, G., Schattschneider, P., Bliokh, K. Y., Nori, F., & Verbeeck, J. (2013). Observation of the Larmor and Gouy Rotations with Electron Vortex Beams. Physical Review Letters, 110(093601). https://doi.org/10.1103/physrevlett.110.093601
E057-02 - Fachbereich Universitäre Serviceeinrichtung für Transmissions- Elektronenmikroskopie E138-03 - Forschungsbereich Functional and Magnetic Materials
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Journal:
Physical Review Letters
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ISSN:
0031-9007
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Date (published):
2013
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Number of Pages:
1
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Peer reviewed:
Yes
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Keywords:
General Physics and Astronomy
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Abstract:
Electron vortex beams carrying intrinsic orbital angular momentum (OAM) are produced in electron microscopes where they are controlled and focused by using magnetic lenses. We observe various rotational phenomena arising from the interaction between the OAM and magnetic lenses. First, the Zeeman coupling, proportional to the OAM and magnetic field strength, produces an OAM-independent Larmor rotat...
Electron vortex beams carrying intrinsic orbital angular momentum (OAM) are produced in electron microscopes where they are controlled and focused by using magnetic lenses. We observe various rotational phenomena arising from the interaction between the OAM and magnetic lenses. First, the Zeeman coupling, proportional to the OAM and magnetic field strength, produces an OAM-independent Larmor rotation of a mode superposition inside the lens. Second, when passing through the focal plane, the electron beam acquires an additional Gouy phase dependent on the absolute value of the OAM. This brings about the Gouy rotation of the superposition image proportional to the sign of the OAM. A combination of the Larmor and Gouy effects can result in the addition (or subtraction) of rotations, depending on the OAM sign. This behavior is unique to electron vortex beams and has no optical counterpart, as Larmor rotation occurs only for charged particles. Our experimental results are in agreement with recent theoretical predictions.
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Research Areas:
Quantum Modelling and Simulation: 50% Materials Characterization: 50%