Molybdenum disilicide belongs to the group of refractory transition metal silicides, which are highly attractive as oxidation-resistant materials to be applied in high-temperature regimes (i.e., above 1000 °C). The unique strength of MoSi₂ is based on its high melting temperature and the formation of a highly protective silicon-based oxide scale. In relation to the metallic and covalent bonding nature, MoSi₂ obtains unique mechanical properties, suggesting this disilicide as a promising candidate for future protective coatings. Within this study, direct current magnetron sputtering (DCMS) as well as high-power pulsed magnetron sputtering (HPPMS) techniques have been deployed to grow MoSi₂ thin films. These coatings were non-reactively deposited in an in-house developed (laboratory-scaled) sputter system using 3’’ compound targets. The influence of the deposition parameters (e.g., substrate bias potential and deposition temperature) on the phase formation, morphology, chemical composition, and mechanical properties (e.g., hardness and indentation modulus) has been investigated systematically by high-resolution characterization methods such as X-ray diffractometry (XRD), scanning and transmission electron microscopy (SEM and TEM), energy-dispersive X-ray spectroscopy (EDS), as well as nanoindentation. Additionally, micro-cantilever bending tests have been performed to determine the fracture toughness of the as deposited thin films. Furthermore, we employed differential scanning calorimetry (DSC) and thermogravimetric analysis (TGA) to investigate the oxidation kinetics. The formed oxide scales have been analysed for different temperature regimes up to 1500 °C (1 hour in synthetic air). The samples were subjected to long-term oxidation treatments in ambient air at 1200 °C for up to 100 hours. Based on these results, sputter deposited MoSi₂ thin films constitute a promising protective coating material applied for challenging environmental conditions.