Non-Radical Chemistries for Lithographic 3D Printing

Abstract

While printing formulation variability allows for some flexibility of material properties in stereolithographic 3D printing via free radical photopolymerization, this flexibility is considerably restricted by a narrow processing window. Recent engineering developments have enlarged this processing window, which creates an avenue towards utilization of radical-free polymerization mechanisms in lithographic 3D printing. For example, by increasing printing temperature in Hot Lithography we were able to produce SLA-printed parts via ionic photopolymerization and polycondensation. Clever utilization of different light sources for the printing process are another possibility to make new chemistry accessible for 3D printing. We have also designed systems where non-radical, wavelength-selective reactions are utilized for network formation.