<div class="csl-bib-body">
<div class="csl-entry">Pichler, J., Bocaniciu, C.-G., Celebi, A. T., & Valtiner, M. (2026). Examination of LEIS sputtering depth profiles by Monte Carlo simulations on silicon oxide and zinc oxide. In <i>Symposium on Surface Science 2026 (3S’26) : St. Christoph am Arlberg, Austria February 22 - 28, 2026 : Contributions</i> (pp. 119–120).</div>
</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/227039
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dc.language.iso
en
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dc.subject
Angewandte Grenzflächenphysik
de
dc.subject
LEIS
en
dc.subject
sputtering depth profiles
en
dc.title
Examination of LEIS sputtering depth profiles by Monte Carlo simulations on silicon oxide and zinc oxide
en
dc.type
Inproceedings
en
dc.type
Konferenzbeitrag
de
dc.description.startpage
119
-
dc.description.endpage
120
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dc.type.category
Abstract Book Contribution
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tuw.booktitle
Symposium on Surface Science 2026 (3S’26) : St. Christoph am Arlberg, Austria February 22 - 28, 2026 : Contributions