Record link: 
http://hdl.handle.net/20.500.12708/227039
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Title: 
Examination of LEIS sputtering depth profiles by Monte Carlo simulations on silicon oxide and zinc oxide
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Citation: 
Pichler, J., Bocaniciu, C.-G., Celebi, A. T., & Valtiner, M. (2026). Examination of LEIS sputtering depth profiles by Monte Carlo simulations on silicon oxide and zinc oxide. In Symposium on Surface Science 2026 (3S’26) : St. Christoph am Arlberg, Austria  February 22 - 28, 2026 : Contributions (pp. 119–120).
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Publication Type: 
Inproceedings - Abstract Book Contribution
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Language: 
English
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Authors: 
Pichler, Julian 
Bocaniciu, Camil-Gratian 
Celebi, Alper Tunga 
Valtiner, Markus 
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Organisational Unit: 
E134-02 - Forschungsbereich Applied Interface Physics 
E056-12 - Fachbereich ENROL DP 
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Published in: 
Symposium on Surface Science 2026 (3S’26) : St. Christoph am Arlberg, Austria February 22 - 28, 2026 : Contributions 
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Date (published): 
2026
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Event name: 
38th Symposium on Surface Science 2026 (3S’26) 
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Event date: 
22-Feb-2026 - 28-Feb-2026
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Event place: 
St. Christoph am Arlberg, Austria
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Number of Pages: 
2
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Keywords: 
Angewandte Grenzflächenphysik
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LEIS; sputtering depth profiles
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Research Areas: 
Surfaces and Interfaces: 100%
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Science Branch: 
1030 - Physik, Astronomie: 100%
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Appears in Collections:
Conference Paper

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