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Record link: 
http://hdl.handle.net/20.500.12708/34936
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Title: 
Low -temperature Si epitaxy on polycrystalline Si seed layers on glass for thin-film Si solar cells
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Citation: 
Rau, B., Klein, J. P., Schneider, J., Muske, M., Conrad, E., Sieber, I., Stöger-Pollach, M., Schattschneider, P., Petter, K., Brehme, S., Gall, S., Lips, K., & Fuhs, W. (2004). Low -temperature Si epitaxy on polycrystalline Si seed layers on glass for thin-film Si solar cells. http://hdl.handle.net/20.500.12708/34936
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Publication Type: 
Report - Research Report
en
Authors: 
Rau, Björn 
Klein, J.P. 
Schneider, J 
Muske, M 
Conrad, E 
Sieber, I 
Stöger-Pollach, Michael 
Schattschneider, Peter 
Petter, K 
Brehme, S. 
Gall, S 
Lips, K 
Fuhs, Walter 
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Organisational Unit: 
E057-02 - Fachbereich Universitäre Serviceeinrichtung für Transmissions- Elektronenmikroskopie 
E138-03 - Forschungsbereich Functional and Magnetic Materials 
E134-03 - Forschungsbereich Atomic and Plasma Physics 
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Date (published): 
2004
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Number of Pages: 
2
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Science Branch: 
Physik, Mechanik, Astronomie
Chemie
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Appears in Collections:
Report

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