2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Book title Buchtitel
2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
 
ISBN
978-4-86348-803-8
 
Publisher Herausgeber
IEEE
 
DOI
10.23919/SISPAD57422.2023
 

Publications Publikationen

Results 1-5 of 5 (Search time: 0.001 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Wilhelmer, Christoph ; Waldhör, Dominic ; Milardovich, Diego ; Cvitkovich, Lukas ; Waltl, Michael ; Grasser, Tibor Intrinsic Electron Trapping in Amorphous Silicon Nitride (a-Si3N4:H)Inproceedings Konferenzbeitrag20-Nov-2023
2Reiter, Tobias ; Toifl, Alexander ; Hössinger, Andreas ; Filipovic, Lado Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND StructuresInproceedings Konferenzbeitrag20-Nov-2023
3Leroch, Sabine ; Stella, Robert ; Hössinger, Andreas ; Filipovic, Lado Molecular Dynamics Study of Al Implantation in 4H-SiCInproceedings Konferenzbeitrag20-Nov-2023
4Filipovic, Lado ; Bobinac, Josip ; Piso, Julius ; Reiter, Tobias Physics-Informed Compact Model for SF6/O2 Plasma EtchingInproceedings Konferenzbeitrag20-Nov-2023
5Hadamek, Tomas ; Jorstad, Nils Petter ; Goes, Wolfgang ; Selberherr, Siegfried ; Sverdlov, Viktor Study of Self-Heating and its Effects in SOT-STT-MRAMInproceedings Konferenzbeitrag20-Nov-2023