Intl. Symposium on Microelectronics Technology and Devices (SBMicro)

Event name
Intl. Symposium on Microelectronics Technology and Devices (SBMicro)
 
Start date
28-08-2006
End date
01-09-2006
 
Location
Ouro Preto
Country
 
Event format Veranstaltungsformat
On Site

Publications Publikationen

Results 1-10 of 10 (Search time: 0.003 seconds).

PreviewAuthors / EditorsTitleTypeIssue Date
1Orio, Roberto ; Carniello, Sara ; Ceric, Hajdin ; Selberherr, Siegfried Analysis of Electromigration in Dual-Damascene Interconnect StructuresKonferenzbeitrag Inproceedings2008
2Osintsev, Dmitri S. ; Sverdlov, Viktor ; Makarov, Alexander ; Selberherr, Siegfried Ballistic Transport Properties of Spin Field-Effect Transistors Built on Silicon and InAs FinsKonferenzbeitrag Inproceedings 2011
3Filipovic, Lado ; Selberherr, Siegfried Electric Field Based Simulations of Local Oxidation Nanolithography Using Atomic Force Microscopy in a Level Set EnvironmentKonferenzbeitrag Inproceedings 2012
4Ceric, Hajdin ; Selberherr, Siegfried Electromigration Modeling for Interconnect Structures in MicroelectronicsKonferenzbeitrag Inproceedings2007
5Sverdlov, Viktor ; Baumgartner, Oskar ; Windbacher, Thomas ; Schanovsky, Franz ; Selberherr, Siegfried Impact of Confinement and Stress on the Subband Parameters in Ultra-Thin Silicon FilmsKonferenzbeitrag Inproceedings2009
6Sverdlov, Viktor ; Selberherr, Siegfried Mobility Modeling in Advanced MOSFETs with Ultra-Thin Silicon Body under StressKonferenzbeitrag Inproceedings2008
7De Orio, Roberto L. ; Ceric, Hajdin ; Selberherr, Siegfried Modeling Electromigration Lifetimes of Copper InterconnectsKonferenzbeitrag Inproceedings 2011
8Ungersböck, Stephan Enzo ; Sverdlov, Viktor ; Kosina, Hans ; Selberherr, Siegfried Modeling of Advanced Semiconductor DevicesKonferenzbeitrag Inproceedings2006
9Orio, Roberto ; Ceric, Hajdin ; Cervenka, Johann ; Selberherr, Siegfried The Effect of Microstructure on Electromigration-Induced Failure DevelopmentKonferenzbeitrag Inproceedings2009
10Ertl, Otmar ; Selberherr, Siegfried Three-Dimensional Plasma Etching Simulation using Advanced Ray Tracing and Level Set TechniquesKonferenzbeitrag Inproceedings2009