Applied Surface Science

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Journal description

Title Titel
Applied Surface Science
 
e-ISSN
1873-5584
 
ISSN
0169-4332
 
Publisher Herausgeber
ELSEVIER
 
Publisher's Address Herausgeber Adresse
RADARWEG 29, AMSTERDAM, Netherlands, 1043 NX
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Author:  Schmid, Ulrich
Subject:  General Chemistry

Results 1-7 of 7 (Search time: 0.002 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Gachot, Carsten ; Catrin, Rodolphe ; Lasagni, Andrés ; Schmid, Ulrich ; Mücklich, Frank Comparative study of grain sizes and orientation in microstructured Au, Pt and W thin films designed by laser interference metallurgyArtikel Article 2009
2Gillinger, M. ; Shaposhnikov, K. ; Knobloch, T. ; Stöger-Pollach, M. ; Artner, W. ; Hradil, K. ; Schneider, M. ; Kaltenbacher, M. ; Schmid, U. Enhanced c-axis orientation of aluminum nitride thin films by plasma-based pre-conditioning of sapphire substrates for SAW applicationsArtikel Article 2018
3Dergez, D. ; Schalko, J. ; Bittner, A. ; Schmid, U. Fundamental properties of a-SiNx:H thin films deposited by ICP-PECVD for MEMS applicationsArtikel Article2013
4Grosser, M. ; Münch, M. ; Seidel, Helmut ; Bienert, C. ; Roosen, A. ; Schmid, Ulrich The impact of substrate properties and thermal annealing on tantalum nitride thin filmsArtikel Article 2012
5Bittner, A. ; Ababneh, A. ; Seidel, H. ; Schmid, U. Influence of the crystal orientation on the electrical properties of AlN thin films on LTCC substratesArtikel Article2010
6Soldera, F. ; Burdiles, G. ; Schmid, U. ; Seidel, H. ; Mücklich, F. Investigation of the Interaction between Electrical Discharges and Low Resistivity Silicon SubstratesArtikel Article2008
7Grosser, M. ; Schmid, U. The impact of annealing temperature and time on the electrical performance of Ti/Pt thin filmsArtikel Article 2010