Full name Familienname, Vorname
Waid, Simon Emanuel
 
Main Affiliation Organisations­zuordnung
 

Results 1-20 of 39 (Search time: 0.002 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Shawrav, Mostafa Moonir ; Cazier, Nicolas ; Waid, Simon ; Schinnerl, Markus ; Wanzenböck, Heinz D. ; Schmid, Silvan FIB investigations on FEBID based gold nanostructuresKonferenzbeitrag Inproceedings2017
2Shawrav, M.M. ; Gökdeniz, Z.G. ; Wanzenboeck, H.D. ; Taus, P. ; Mika, J.K. ; Waid, S. ; Bertagnolli, E. Chlorine based focused electron beam induced etching: A novel way to pattern germaniumArtikel Article 2016
3Shawrav, Mostafa Moonir ; Wanzenböck, Heinz D. ; Taus, Philipp ; Waid, Simon ; Gökdeniz, Z.G. ; Bertagnolli, Emmerich Focused electron beam induced surface reactions - from surface termination to etchingKonferenzbeitrag Inproceedings2016
4Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Mika, Johann ; Waid, Simon ; Gökdeniz, Z.G. ; Rödiger, Peter ; Bertagnolli, Emmerich Focused Electron Beam Induced Etching - Advantages, Features & Limitations of FEBIE with ChlorineKonferenzbeitrag Inproceedings2015
5Lumpi, Daniel ; Holzer, Brigitte ; Bintinger, Johannes ; Horkel, Ernst ; Waid, Simon ; Wanzenböck, Heinz D. ; Marchetti-Deschmann, Martina ; Hametner, Christian ; Bertagnolli, Emmerich ; Kymissis, Ioannis ; Fröhlich, Johannes Substituted triphenylamines as building blocks for star shaped organic electronic materialsArtikel Article 2015
6Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Mika, Johann ; Waid, Simon ; Gökdeniz, Z.G. ; Rödinger, Peter ; Bertagnolli, Emmerich Subtractive direct-writing with a focused electron beam - Tailoring monocrystalline semiconductors without carbon contamination by etchingKonferenzbeitrag Inproceedings2015
7Shawrav, Mostafa Moonir ; Mika, Johann ; Wanzenböck, Heinz D. ; Gökdeniz, Z.G. ; Waid, Simon ; Bertagnolli, Emmerich Chlorine based focused electron beam-induced surface patterning of semiconductor nanowiKonferenzbeitrag Inproceedings2015
8Gavagnin, Marco ; Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Belic, Domagoj ; Wachter, Stefan ; Waid, Simon ; Stöger-Pollach, Michael ; Bertagnolli, Emmerich Focused Electron Beam-Induced CVD of Iron: a Practical Guide for Direct WritingArtikel Article2014
9Lindsey, S. ; Waid, S. ; Hobler, G. ; Wanzenböck, H.D. ; Bertagnolli, E. Inverse modeling of FIB milling by dose profile optimizationArtikel Article 2014
10Waid, Simon ; Wanzenboeck, Heinz D. ; Muehlberger, Michael ; Gavagnin, Marco ; Bertagnolli, Emmerich Focused ion beam direct patterning of hardmask layersArtikel Article 2014
11Waid, Simon ; Wanzenboeck, Heinz D ; Muehlberger, Michael ; Gavagnin, Marco ; Bertagnolli, Emmerich Generation of 3D nanopatterns with smooth surfacesArtikel Article 2014
12Wanzenböck, Heinz D. ; Waid, Simon ; Hobler, Gerhard ; Lindsey, Sloan 2.5D-Nanoimprint LithographyPräsentation Presentation2014
13Waid, Simon-Emanuel 3D nanoimprint template generation and defect engineering by focused ion beam direct write technologiesThesis Hochschulschrift2013
14Waid, Simon ; Wanzenboeck, Heinz D. ; Gavagnin, Marco ; Langegger, Ruppert ; Muehlberger, Michael ; Bertagnolli, Emmerich Focused ion beam induced Ga-contamination-An obstacle for UV-nanoimprint stamp repair?Artikel Article 2013
15Lindsey, Sloan ; Waid, Simon ; Hobler, Gerhard ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich Inverse Modeling of FIB Milling by Dose Profile OptimizationPräsentation Presentation2013
16Waid, Simon ; Mika, Johann ; Lindsey, Sloan ; Wanzenböck, Heinz D. ; Hobler, Gerhard ; Bertagnolli, Emmerich Fabrication of 3D Axon Isolation Channels by Inverse Modelling Assisted Focused Ion Beam PatterningPräsentation Presentation2012
17Waid, Simon ; Mühlberger, Michael ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich Impact of Focused Ion Beam (FIB) Stamp Repair on UV Nanoimprint Lithography (NIL) Resist CuringPräsentation Presentation2012
18Waid, Simon ; Wanzenböck, Heinz D. ; Mühlberger, Michael ; Bertagnolli, Emmerich Impact of Ga contamination on UV-NIL stamp repairPräsentation Presentation2012
19Waid, Simon Ion beam induced processing - Principles & ApplicationsPräsentation Presentation2012
20Waid, Simon ; Mühlberger, Michael ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich The Impact of Focused Ion Beam Stamp Repair on Resist Curing in UV-based Nanoimprint LithographyPräsentation Presentation2012