Record link: 
http://hdl.handle.net/20.500.12708/148376
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Title: 
Chlorine based focused electron beam induced etching: A novel way to pattern germanium
en
Citation: 
Shawrav, M. M., Gökdeniz, Z. G., Wanzenboeck, H. D., Taus, P., Mika, J. K., Waid, S., & Bertagnolli, E. (2016). Chlorine based focused electron beam induced etching: A novel way to pattern germanium. Materials Science in Semiconductor Processing, 42, 170–173. https://doi.org/10.1016/j.mssp.2015.08.033
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Publisher DOI: 
10.1016/j.mssp.2015.08.033
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Publication Type: 
Article - Original Research Article
en
Language: 
English
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Authors: 
Shawrav, M.M. 
Gökdeniz, Z.G. 
Wanzenboeck, H.D. 
Taus, P. 
Mika, J.K. 
Waid, S. 
Bertagnolli, E. 
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Organisational Unit: 
E362 - Institut für Festkörperelektronik 
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Journal: 
Materials Science in Semiconductor Processing 
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ISSN: 
1369-8001
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Date (published): 
2016
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Number of Pages: 
4
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Publisher: 
ELSEVIER SCI LTD
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Peer reviewed: 
Yes
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Keywords: 
Mechanical Engineering; Mechanics of Materials; Condensed Matter Physics; General Materials Science
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Research Areas: 
Materials Characterization: 25%
Surfaces and Interfaces: 25%
Nanoelectronics: 50%
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Science Branch: 
Elektrotechnik, Elektronik, Informationstechnik
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