Name Card

Full name Familienname, Vorname
Souza Berti Rodrigues, Francio
 
Main Affiliation Organisations­zuordnung
 

Own Publications Eigene Publikationen

Results 1-14 of 14 (Search time: 0.001 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Reiter-2023-Solid-State Electronics-vor.pdf.jpgReiter, Tobias ; Aguinsky, Luiz Felipe ; Souza Berti Rodrigues, Francio ; Weinbub, Josef ; Hössinger, Andreas ; Filipovic, Lado Modeling the Impact of Incomplete Conformality During Atomic Layer ProcessingArticle Artikel Jan-2024
2Souza Berti Rodrigues-2023-Journal of Computational Electronics-vor.pdf.jpgSouza Berti Rodrigues, Francio ; Aguinsky, Luiz Felipe ; Lenz, Christoph ; Hössinger, Andreas ; Weinbub, Josef 3D modeling of feature-scale fluorocarbon plasma etching in silicaArticle Artikel Oct-2023
3Aguinsky, Luiz Felipe ; Toifl, Alexander ; Souza Berti Rodrigues, Francio ; Hössinger, Andreas ; Weinbub, Josef A Modern Formulation of Knudsen Diffusion with Applications to NanofabricationInproceedings Konferenzbeitrag 1-Sep-2023
4Aguinsky-2023-Solid-State Electronics-vor.pdf.jpgAguinsky, Luiz Felipe ; Souza Berti Rodrigues, Francio ; Reiter, Tobias ; Klemenschits, Xaver ; Filipovic, Lado ; Hössinger, Andreas ; Weinbub, Josef Modeling Incomplete Conformality During Atomic Layer Deposition in High Aspect Ratio StructuresArticle Artikel Mar-2023
5Lenz-2023-Solid-State Electronics-vor.pdf.jpgLenz, Christoph ; Manstetten, Paul ; Aguinsky, Luiz Felipe ; Rodrigues, Francio ; Hössinger, Andreas ; Weinbub, Josef Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD SimulationsArtikel Article Feb-2023
6Aguinsky, Luiz Felipe ; Rodrigues, Frâncio ; Wachter, Georg ; Trupke, Michael ; Schmid, Ulrich ; Hössinger, Andreas ; Weinbub, Josef Phenomenological Modeling of Low-Bias Sulfur Hexafluoride Plasma Etching of SiliconArtikel Article 2022
7Rodrigues, Francio ; Aguinsky, Luiz Felipe ; Hössinger, Andreas ; Weinbub, Josef 3D Feature-Scale Modeling of Highly Selective Fluorocarbon Plasma EtchingKonferenzbeitrag Inproceedings 2022
8Lenz, Christoph ; Toifl, Alexander ; Quell, Michael ; Rodrigues, Francio ; Hössinger, Andreas ; Weinbub, Josef Curvature Based Feature Detection for Hierarchical Grid Refinement in TCAD Topography SimulationsArtikel Article 2022
9Aguinsky, Luiz Felipe ; Rodrigues, Francio ; Klemenschits, Xaver ; Filipovic, Lado ; Hössinger, Andreas ; Weinbub, Josef Modeling Non-Ideal Conformality during Atomic Layer Deposition in High Aspect Ratio StructuresKonferenzbeitrag Inproceedings 2022
10Aguinsky, Luiz Felipe ; Wachter, Georg ; Manstetten, Paul ; Rodrigues, Frâncio ; Trupke, Michael ; Schmid, Ulrich ; Hössinger, Andreas ; Weinbub, Josef Modeling and Analysis of Sulfur Hexafluoride Plasma Etching for Silicon Microcavity ResonatorsArtikel Article 2021
11Toifl, A ; Rodrigues, F ; Aguinsky, L F ; Hössinger, A ; Weinbub, J Continuum Level-Set Model for Anisotropic Wet Etching of Patterned Sapphire SubstratesArtikel Article 2021
12Rodrigues, Francio ; Aguinsky, Luiz Felipe ; Toifl, Alexander ; Hössinger, Andreas ; Weinbub, Josef Feature Scale Modeling of Fluorocarbon Plasma Etching for Via Structures including Faceting PhenomenaKonferenzbeitrag Inproceedings 2021
13Rodrigues, Francio ; Aguinsky, Luiz Felipe ; Toifl, Alexander ; Scharinger, Alexander ; Hössinger, Andreas ; Weinbub, Josef Surface Reaction and Topography Modeling of Fluorocarbon Plasma EtchingKonferenzbeitrag Inproceedings2021
14Aguinsky, Luiz Felipe ; Wachter, Georg ; Scharinger, Alexander ; Rodrigues, Francio ; Toifl, Alexander ; Trupke, Michael ; Schmid, Ulrich ; Hössinger, Andreas ; Weinbub, Josef Feature-Scale Modeling of Low-Bias SF₆ Plasma Etching of SiKonferenzbeitrag Inproceedings 2021