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Record link: 
http://hdl.handle.net/20.500.12708/137968
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Title: 
Modeling and Analysis of Sulfur Hexafluoride Plasma Etching for Silicon Microcavity Resonators
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Citation: 
Aguinsky, L. F., Wachter, G., Manstetten, P., Rodrigues, F., Trupke, M., Schmid, U., Hössinger, A., & Weinbub, J. (2021). Modeling and Analysis of Sulfur Hexafluoride Plasma Etching for Silicon Microcavity Resonators. Journal of Micromechanics and Microengineering, 31(12), 125003. https://doi.org/10.1088/1361-6439/ac2bad
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Publisher DOI: 
10.1088/1361-6439/ac2bad
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Publication Type: 
Article - Original Research Article
en
Authors: 
Aguinsky, Luiz Felipe 
Wachter, Georg 
Manstetten, Paul 
Rodrigues, Frâncio 
Trupke, Michael 
Schmid, Ulrich 
Hössinger, Andreas 
Weinbub, Josef 
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Organisational Unit: 
E360 - Institut für Mikroelektronik 
E366-02 - Forschungsbereich Mikrosystemtechnik 
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Journal: 
Journal of Micromechanics and Microengineering 
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ISSN: 
0960-1317
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Date (published): 
2021
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Number of Pages: 
9
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Peer reviewed: 
Yes
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Keywords: 
Electrical and Electronic Engineering; Mechanical Engineering; Mechanics of Materials; Electronic, Optical and Magnetic Materials
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Research Areas: 
Modelling and Simulation: 100%
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Science Branch: 
Elektrotechnik, Elektronik, Informationstechnik
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