Bahr, A. A. I., Richter, S., Wojcik, T., Ramm, J., Hunold, O., Koloszvári, S., & Riedl-Tragenreif, H. (2022, May). Microstructure and Oxidation Behaviour of MoSi₂ Thin Films Grown by DCMS and HiPIMS [Poster Presentation]. 48th International Conference on Metallurgical Coatings and Thin Films, ICMCTF, San Diego, CA, United States of America (the).
Refractory transition-metal disilicides (TMSi₂) can be considered as promising candidates to be applied as protective coatings in high-temperature applications as they have attractive combined properties such as high melting point, acceptable mechanical properties and especially high oxidation resistance in air. MoSi₂ exhibits an attractive mix of good mechanical properties and outstanding high-temperature oxidation resistance due to the formation of a protective silicon-based oxide. In our study, we employed direct current magnetron sputtering (DCMS) and High-power magnetron sputtering (HiPIMS) techniques to synthesize MoSi₂ thin films. We investigated the influence of the deposition parameters on the phase formation and the mechanical properties of the films. Moreover, the oxidation kinetics were analyzed at different temperature regimes up to 1500 °C. The coatings were characterized in terms of chemical composition, phase constitution, and mechanical properties using high-resolution characterization techniques.
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