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Record link: 
http://hdl.handle.net/20.500.12708/164263
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Title: 
Formation Of Arsenic Rich Silicon Oxide Under Plasma Immersion Ion Implantation And Laser Annealing
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Citation: 
Meirer, F., Demenev, E., Giubertoni, D., Gennaro, S., Vanzetti, L., Pepponi, G., Bersani, M., Sahiner, M. A., Steinhauser, G., Foad, M. A., Woicik, J. C., Mehta, A., & Pianetta, P. (2012). Formation Of Arsenic Rich Silicon Oxide Under Plasma Immersion Ion Implantation And Laser Annealing. AIP Conference Proceedings. https://doi.org/10.1063/1.4766520
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Publisher DOI: 
10.1063/1.4766520
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Publication Type: 
Article - Original Research Article
en
Authors: 
Meirer, F. 
Demenev, E. 
Giubertoni, D. 
Gennaro, S. 
Vanzetti, L. 
Pepponi, G. 
Bersani, M. 
Sahiner, M. A. 
Steinhauser, G. 
Foad, M. A. 
Woicik, J. C. 
Mehta, A. 
Pianetta, P. 
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Organisational Unit: 
E141-05 - Forschungsbereich Radiation Physics 
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ISSN: 
0094-243X
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Date (published): 
2012
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Number of Pages: 
6
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Peer reviewed: 
No
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Research Areas: 
Quantum Modelling and Simulation: 100%
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Science Branch: 
Physik, Mechanik, Astronomie
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Appears in Collections:
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