Record link: 
http://hdl.handle.net/20.500.12708/183920
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Title: 
Quantitative characterisation of silicon- and aluminium oxynitride films produced by reactive dc-magnetron sputtering
en
Citation: 
Dreer, S. (2000). Quantitative characterisation of silicon- and aluminium oxynitride films produced by reactive dc-magnetron sputtering [Dissertation, Technische Universität Wien]. reposiTUm. http://hdl.handle.net/20.500.12708/183920
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CatalogPlus: 
AC03025453
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Publication Type: 
Thesis - Dissertation
en
Language: 
English
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Authors: 
Dreer, Sabine 
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Date (published): 
2000
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Keywords: 
Dünne Schicht; Siliciumoxinitride; Aluminiumoxinitride; Magnetronsputtern; Quantitative Analyse
de
Additional information: 
Zsfassung in dt. Sprache
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Appears in Collections:
Thesis

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