Bahr, A. A. I., Beck, O., Glechner, T., Grimmer, A., Wojcik, T., Kutrowatz, P., Ramm, J., Hunold, O., Kolozsvári, S., Polcik, P., Ntemou, E., Primetzhofer, D., & Riedl-Tragenreif, H. (2023). Quaternary diborides—improving the oxidation resistance of TiB2 ± z coatings by disilicide alloying. Materials Research Letters, 11(9), 733–741. https://doi.org/10.1080/21663831.2023.2225554
To overcome the limited oxidation resistance of the emerging class of transition metal borides, we suggest within this study novel quaternary diborides, Ti-TM-Si-B2 ± z (TM = Ta, Mo), achieving the compromise between excellent oxidation resistance and requirements of hard coatings. Single-phase AlB2-type structured Ti-TM-Si-B2 ± z films (3–5 µm) are sputter-deposited from TiB2/TMSi2 targets. The Ti-Ta-Si-B2 ± z coatings exhibit 36 GPa in hardness, while maintaining strongly retarded oxidation kinetics till 1000°C. Ti-Mo-Si-B2 ± z coatings preserve a hardness up to 27 GPa, although outperforming all their counterparts by featuring outstanding oxidation resistance with 440 nm oxide scale thickness after 1 h at 1200°C.
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Forschungsinfrastruktur:
Röntgenzentrum
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Projekttitel:
Oberflächentechnik von hochbeanspruchten Präzisionskomponenten: CDL-SEC (Christian Doppler Forschungsgesellschaft)
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