In additive manufacturing the demand for light-induced step-growth polymerization is still high, as those materials allow for tougher materials compared to free radical polymerization. The thiol-ene reaction leads to less shrinkage and tougher photopolymers, but it also comes with drawbacks, like the availability of thiols, their strong odor and a short storage stability. Replacing the thiols with alcohols allows for a wider variety of available monomers without the odor. The oxa-ene reaction is a Michael-type addition needing a base catalyst. We hereby report the development of a set of new Lewis-type photobase generators for oxa-Michael formulations. Our work includes the synthesis of those photobase generators, their characterization, and application in both model reactions and polymeric formulations. In the model reactions, the mechanism of photobase generator catalyzed oxa-Michael reaction was investigated compared to free base catalyzed oxa-Michael reactions.