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Record link:
https://doi.org/10.34726/hss.2025.117520
http://hdl.handle.net/20.500.12708/217364
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Title:
Dual cure systems for tough photopolymers for 3D printing
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Citation:
Mayer, F. (2025).
Dual cure systems for tough photopolymers for 3D printing
[Dissertation, Technische Universität Wien]. reposiTUm. https://doi.org/10.34726/hss.2025.117520
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reposiTUm DOI:
10.34726/hss.2025.117520
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CatalogPlus:
AC17593344
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Publication Type:
Thesis - Dissertation
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Language:
English
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Authors:
Mayer, Florian
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Advisor:
Liska, Robert
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Co-advisor:
Ehrmann, Katharina
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Organisational Unit:
E163 - Institut für Angewandte Synthesechemie
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Date (published):
2025
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Number of Pages:
206
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Keywords:
radikalische Photopolymerisation - kationische Photopolymerisation - Zwei-Wellenlängen-Lichthärtung
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radical photopolymerization - cationic photopolymerization - dual-wavelength curing
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Additional information:
Abweichender Titel nach Übersetzung der Verfasserin/des Verfassers
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License:
In Copyright
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Appears in Collections:
Thesis
Fulltext (Version of Record (published version))
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Embargo. Accessible from 31.03.2027
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