So far, in industrial applications, photobase generators are less commonly used compared to the well-investigated and established radical photoinitiators and photoacid generators. However, in addition to being non-corrosive to metal substates and insensitive to oxygen, photobase generators broaden the range of materials that can be manufactured through light irradiation, particularly for applications in additive manufacturing and coatings. Notably, their ability to facilitate various photo-induced step-growth polymerizations, such as the cyclotrimerization of isocyanates and the polyaddition of hydroxy groups to electrophilic alkenes, makes them a promising candidate for commercial photoinitiators. The polyaddition of isocyanates results in tough, flame-retardant, high-performance materials, while oxa-ene reactions offer an odor-free, highly stable alternative to established thiol-ene photopolymerization