Bakali, E., Artner, W., Beiser, M., Bernardi, J., Detz, H., Eguchi, G., Foelske, A., Giparakis, M., Herzig, C., Limbeck, A., Nguyen, D. H., Prochaska, L., Prokofiev, A., Sauer, M., Schwarz, S., Schrenk, W., Strasser, G., Svagera, R., Taupin, M., … Bühler-Paschen, S. (2022). A Knudsen cell approach for the molecular beam epitaxy of the heavy fermion compound YbRh2Si2. Journal of Crystal Growth, 595, Article 126804. https://doi.org/10.1016/j.jcrysgro.2022.126804
E362-01 - Forschungsbereich Optoelektronische Materialien E057-12 - Fachbereich Zentrum für Mikro und Nanostrukturen E138-04 - Forschungsbereich Quantum Materials E057-04 - Fachbereich Röntgenzentrum E138-50-3 - Fachgruppe Technische Assistenz E057-02 - Fachbereich Universitäre Serviceeinrichtung für Transmissions- Elektronenmikroskopie E057-05 - Fachbereich Analytical Instrumentation Center E164-04-1 - Forschungsgruppe Elektrochemische Energieumwandlung E164-01-2 - Forschungsgruppe Oberflächen-, Spurenanalytik und Chemometrie
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Journal:
Journal of Crystal Growth
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ISSN:
0022-0248
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Date (published):
1-Oct-2022
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Number of Pages:
6
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Publisher:
Elsevier
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Peer reviewed:
Yes
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Keywords:
Reflection high energy electron diffraction; X-ray diffraction; Molecular beam epitaxy; Metals; Rare earth compounds; Superconducting materials
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Abstract:
Thin films of the heavy fermion compound YbRh2Si2 were grown by molecular beam epitaxy on Ge (001) substrates using effusion cells. As-grown YbRh2Si2 thin films were characterized by a wide range of characterization techniques. X-ray diffraction yields a set of (00l) peaks, demonstrating epitaxial growth along the crystallographic c direction, with a lattice parameter c ranging from 9.84 Å–9.95 Å. The electrical resistivity shows behavior similar to YbRh2Si2 films grown previously using electron-beam evaporators for Rh and Si. The most stoichiometric sample appears to have the highest quality: It has the highest intensity ratio of the YbRh2Si2 (004) diffraction peak to the Ge (004) peak, the highest R(10 K)/R(2.3 K) ratio, a smallest surface roughness, and only a small density of surface defects.
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Research facilities:
Zentrum für Mikro & Nanostrukturen
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Project title:
Quantenkritisches Verhalten und neue Phasen bei ultratiefen Temperaturen: P29296-N27 (Fonds zur Förderung der wissenschaftlichen Forschung (FWF)) Thermoelektrische Eigenschaften von komplexen Mesodrähten: P 29279-N27 (Fonds zur Förderung der wissenschaftlichen Forschung (FWF)) Extreme Spin-Bahn-Kopplung für neue Quantenzustände: I 4047-N27 (Fonds zur Förderung der wissenschaftlichen Forschung (FWF)) Europäische Mikrokelvin Plattform: 824109 (European Commission)
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