Record link: 
http://hdl.handle.net/20.500.12708/143564
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Title: 
Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes
en
Citation: 
Schuller, P., Rothbauer, M., Eilenberger, C., Kratz, S. R. A., Höll, G., Taus, P., Schinnerl, M., Genser, J., Ertl, P., & Wanzenboeck, H. (2019). Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes. MethodsX, 6, 2606–2613. https://doi.org/10.1016/j.mex.2019.10.038
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Publisher DOI: 
10.1016/j.mex.2019.10.038
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Publication Type: 
Article - Original Research Article
en
Language: 
English
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Authors: 
Schuller, Patrick 
Rothbauer, Mario 
Eilenberger, Christoph 
Kratz, Sebastian Rudi Adam 
Höll, Gregor 
Taus, Philipp 
Schinnerl, Markus 
Genser, Jakob 
Ertl, Peter 
Wanzenboeck, Heinz 
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Organisational Unit: 
E362 - Institut für Festkörperelektronik 
E163-03-1 - Forschungsgruppe Cell Chip 
E164-02-3 - Forschungsgruppe Cell Chip 
E362-01 - Forschungsbereich Optoelektronische Materialien 
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Journal: 
MethodsX 
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Date (published): 
2019
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Number of Pages: 
8
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Publisher: 
Elsevier BV
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Peer reviewed: 
Yes
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Keywords: 
Medical Laboratory Technology; Clinical Biochemistry
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Science Branch: 
Elektrotechnik, Elektronik, Informationstechnik
Chemie
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Appears in Collections:
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