Title: Synthesis and characterization of novel photoresist for extreme UV lithography
Other Titles: Synthese und Charakterisierung neuartiger Photolacke für die EUV-Lithographie
Language: English
Authors: Huang, Ching-Chung 
Qualification level: Doctoral
Advisor: Stampfl, Jürgen  
Issue Date: 2021
Number of Pages: 216
Qualification level: Doctoral
Keywords: Lithographie; Photolacke; EUV; Hybridmaterialien
Lithography; Photoresist; EUV; hybrid materials
URI: https://doi.org/10.34726/hss.2021.59302
DOI: 10.34726/hss.2021.59302
Library ID: AC16147293
Organisation: E308 - Institut für Werkstoffwissenschaft und Werkstofftechnologie 
Publication Type: Thesis
Appears in Collections:Thesis

Files in this item:

File Description SizeFormat Existing users please Login
Huang Ching-Chung - 2021 - Synthesis and Characterization of Novel Photoresist...pdf7.22 MBAdobe PDFThumbnail
Embargoed until December 1, 2023
Show full item record

Page view(s)

checked on Jun 11, 2021


checked on Jun 11, 2021

Google ScholarTM


Items in reposiTUm are protected by copyright, with all rights reserved, unless otherwise indicated.