Title: Synthesis and characterization of novel photoresist for extreme UV lithography
Other Titles: Synthese und Charakterisierung neuartiger Photolacke für die EUV-Lithographie
Language: English
Authors: Huang, Ching-Chung 
Qualification level: Doctoral
Advisor: Stampfl, Jürgen  
Issue Date: 2021
Citation: 
Huang, C.-C. (2021). Synthesis and characterization of novel photoresist for extreme UV lithography [Dissertation, Technische Universität Wien]. reposiTUm. https://doi.org/10.34726/hss.2021.59302
Number of Pages: 216
Qualification level: Doctoral
Keywords: Lithographie; Photolacke; EUV; Hybridmaterialien
Lithography; Photoresist; EUV; hybrid materials
URI: https://doi.org/10.34726/hss.2021.59302
http://hdl.handle.net/20.500.12708/16872
DOI: 10.34726/hss.2021.59302
Library ID: AC16147293
Organisation: E308 - Institut für Werkstoffwissenschaft und Werkstofftechnologie 
Publication Type: Thesis
Hochschulschrift
Appears in Collections:Thesis

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