Characterization of Surface Modifications in Oxygen Plasma-Treated Teflon AF1600

Abstract

We explore the surface properties of Teflon AF1600 films treated by oxygen plasma with various procedure parameters. Contact angle (CA) measurements, scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray photoelectron microscopy (XPS) are employed to investigate the wetting behavior, surface topography, and chemical composition, respectively. While the etched thickness reveals a linear relationship to the applied plasma energy, the surface presents various wetting properties and topographies depending on the plasma energy: low advancing and zero receding CA (1 kJ), super high advancing and zero receding CA (2–3 kJ), and super high advancing and high receding CA (≥4.5 kJ) for the wetting behaviors; pillar-like (≤6 kJ) and fiber-like (>6 kJ) nanoscaled structures for the topographies. The results of XPS analysis reveal slight changes in the presence of O- and F-components (<4%) after oxygen plasma treatment. Furthermore, we discuss the applicability of the Wenzel and Cassie–Baxter equations and employ the Friction-Adsorption (FA) model, where no wetting state and structure-related parameters are needed, to describe the CAs on the plasma-treated surfaces. Additionally, we conduct electrowetting experiments on the treated surfaces and find that the experimental results of the advancing CA are in good agreement with the predictions of the FA model.