Influence of Si and Y SZ on the stabilization of amorphous Al2O3-based thin films at high temperatures

Scholz, Florentine

doi:10.34726/hss.2025.120458

Record link:

https://doi.org/10.34726/hss.2025.120458
http://hdl.handle.net/20.500.12708/214625

Title:

Influence of Si and Y SZ on the stabilization of amorphous Al2O3-based thin films at high temperatures

Citation:

Scholz, F. (2025). Influence of Si and Y SZ on the stabilization of amorphous Al2O3-based thin films at high temperatures [Diploma Thesis, Technische Universität Wien]. reposiTUm. https://doi.org/10.34726/hss.2025.120458

reposiTUm DOI:

10.34726/hss.2025.120458

CatalogPlus:

AC17500467

Publication Type:

Thesis - Diplomarbeit

Language:

English

Authors:

Scholz, Florentine

Advisor:

Riedl-Tragenreif, Helmut

Co-advisor:

Salvadores Farran, Norma

Organisational Unit:

E308 - Institut für Werkstoffwissenschaft und Werkstofftechnologie

Date (published):

2025

Number of Pages:

Keywords:

HiPIMS; amorphous Al2O3

Additional information:

Arbeit an der Bibliothek noch nicht eingelangt - Daten nicht geprueft - gesperrte Arbeit (bis 2027-04-16+02:00)
Abweichender Titel nach Übersetzung der Verfasserin/des Verfassers

License:

In Copyright

Appears in Collections:

Thesis

Fulltext (Version of Record (published version))

Adobe PDF

(6.15 MB)