Record link: 
https://doi.org/10.34726/hss.2025.120458
http://hdl.handle.net/20.500.12708/214625
-
Title: 
Influence of Si and Y S Z on the stabilization of amorphous Al2O3-based thin films at high temperatures
en
Citation: 
Scholz, F. (2025). Influence of Si and Y S Z on the stabilization of amorphous Al2O3-based thin films at high temperatures [Diploma Thesis, Technische Universität Wien]. reposiTUm. https://doi.org/10.34726/hss.2025.120458
-
reposiTUm DOI: 
10.34726/hss.2025.120458
-
CatalogPlus: 
AC17500467
-
Publication Type: 
Thesis - Diplomarbeit
en
Language: 
English
-
Authors: 
Scholz, Florentine 
-
Advisor: 
Riedl-Tragenreif, Helmut 
-
Co-advisor: 
Salvadores Farran, Norma 
-
Organisational Unit: 
E308 - Institut für Werkstoffwissenschaft und Werkstofftechnologie 
-
Date (published): 
2025
-
Number of Pages: 
69
-
Keywords: 
HiPIMS; amorphous Al2O3
en
License: 
In Copyright
de
Appears in Collections:
Thesis

Fulltext (Version of Record (published version))
Adobe PDF
(6.15 MB)
Open Access In Copyright
Embargo. Accessible from 30.04.2027
Show full item record

Page view(s)

84
checked on Apr 29, 2025

Download(s)

1
checked on Apr 29, 2025

Google ScholarTM

Check