Record link: 
http://hdl.handle.net/20.500.12708/221807
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Title: 
Local Ferroelectric Gating in Schottky-Junction Transistors
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Citation: 
Nazzari, D., Wind, L., Wahler, V., Rossi Chiara, Esseni, D., Sistani, M., Fuchsberger, A., & Weber, W. M. (2025, March 12). Local Ferroelectric Gating in Schottky-Junction Transistors [Conference Presentation]. Novel High-k Application Workshop 2025, Dresden, Germany.
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Publication Type: 
Presentation - Conference Presentation
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Language: 
English
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Authors: 
Nazzari, Daniele 
Wind, Lukas 
Wahler, Viktor 
Rossi Chiara 
Esseni, David 
Sistani, Masiar 
Fuchsberger, Andreas 
Weber, Walter Michael 
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Organisational Unit: 
E362-02 - Forschungsbereich Nanoelektronische Bauelemente 
E057-12 - Fachbereich Zentrum für Mikro und Nanostrukturen 
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Date (published): 
12-Mar-2025
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Event name: 
Novel High-k Application Workshop 2025 
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Event date: 
12-Mar-2025 - 13-Mar-2025
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Event place: 
Dresden, Germany
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Keywords: 
Non-Volatile Reconfigurability; Beyond Von Neumann; Ferroelectricity
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Research Areas: 
Materials Characterization: 40%
Nanoelectronics: 60%
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Science Branch: 
2020 - Elektrotechnik, Elektronik, Informationstechnik: 100%
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