Record link: 
http://hdl.handle.net/20.500.12708/232394
-
Title: 
Quantitative sputter depth profiling: LEIS measurements and SDTrimSP simulations on silicon oxide
en
Citation: 
Pichler, J., Bocaniciu, C.-G., Celebi, A. T., & Valtiner, M. (2026, March 9). Quantitative sputter depth profiling: LEIS measurements and SDTrimSP simulations on silicon oxide [Poster Presentation]. DPG Spring Meeting 2026 of the Condensed Matter Section (SKM), Dresden, Germany. http://hdl.handle.net/20.500.12708/232394
-
Publication Type: 
Presentation - Poster Presentation
en
Language: 
English
-
Authors: 
Pichler, Julian 
Bocaniciu, Camil-Gratian 
Celebi, Alper Tunga 
Valtiner, Markus 
-
Organisational Unit: 
E134-02 - Forschungsbereich Applied Interface Physics 
E056-12 - Fachbereich ENROL DP 
-
Date (published): 
9-Mar-2026
-
Event name: 
DPG Spring Meeting 2026 of the Condensed Matter Section (SKM) 
-
Event date: 
8-Mar-2026 - 13-Mar-2026
-
Event place: 
Dresden, Germany
-
Keywords: 
Monte Carlo simulations; sputtering; LEIS
en
Research Areas: 
Surfaces and Interfaces: 100%
-
Science Branch: 
1030 - Physik, Astronomie: 100%
-
Appears in Collections:
Presentation

Show full item record

Google ScholarTM

Check