Record link: 
http://hdl.handle.net/20.500.12708/78553
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Title: 
Integrity of diffusion barriers in modern high-voltage power semiconductors
en
Citation: 
Fugger, M. (2014). Integrity of diffusion barriers in modern high-voltage power semiconductors [Dissertation, Technische Universität Wien]. reposiTUm. http://hdl.handle.net/20.500.12708/78553
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CatalogPlus: 
AC12024441
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Publication Type: 
Thesis - Dissertation
en
 
Hochschulschrift - Dissertation
de
Language: 
English
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Authors: 
Fugger, Michael 
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Advisor: 
Hutter, Herbert 
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Co-advisor: 
Danninger, Herbert 
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Organisational Unit: 
E164 - Institut für Chemische Technologien und Analytik 
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Date (published): 
2014
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Number of Pages: 
134
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Keywords: 
TOF-SIMS; Halbleiter
de
 
TOF-SIMS; Semiconductor
en
Additional information: 
Zusammenfassung in deutscher Sprache
Abweichender Titel laut Übersetzung der Verfasserin/des Verfassers
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Appears in Collections:
Thesis

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