Record link: 
http://hdl.handle.net/20.500.12708/219724
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Title: 
Low temperature epitaxy of supersaturated SiGe and Ge layers on Si and SOI
en
Citation: 
Prado-Navarrete E, Aberl, J., Marböck J, Salomon, A., Haya Enriquez D, Wilfingseder C, Fromherz, T., Wind, L., Fuchsberger, A., Sistani, M., Weber, W. M., & Brehm, M. (2025, September 15). Low temperature epitaxy of supersaturated SiGe and Ge layers on Si and SOI [Conference Presentation]. The 2025 Fall Meeting of the European Materials Research Society (E-MRS), Warsaw, Poland. http://hdl.handle.net/20.500.12708/219724
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Publication Type: 
Presentation - Conference Presentation
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Language: 
English
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Authors: 
Prado-Navarrete E 
Aberl, Johannes 
Marböck J 
Salomon, Anton 
Haya Enriquez D 
Wilfingseder C 
Fromherz, Thomas 
Wind, Lukas 
Fuchsberger, Andreas 
Sistani, Masiar 
Weber, Walter Michael 
Brehm, Moritz 
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Organisational Unit: 
E362-02 - Forschungsbereich Nanoelektronische Bauelemente 
E057-12 - Fachbereich Zentrum für Mikro und Nanostrukturen 
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Date (published): 
15-Sep-2025
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Event name: 
The 2025 Fall Meeting of the European Materials Research Society (E-MRS) 
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Event date: 
15-Sep-2025 - 18-Sep-2025
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Event place: 
Warsaw, Poland
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Keywords: 
epitaxy; SiGe; Silizium; SOI
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Research Areas: 
Materials Characterization: 50%
Surfaces and Interfaces: 50%
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Science Branch: 
2020 - Elektrotechnik, Elektronik, Informationstechnik: 100%
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