Scholz, F., Hemetsberger, J., Laudani, F., Rath, J., Sauer, M., Fahrnberger, F., Hahn, M., Hutter, H., Gies, A., Kolozsvári, S., Salvadores Farran, N., Foelske, A., & Riedl-Tragenreif, H. (2025, September 7). Usage of advanced analytical techniques assessing the influence of Si on the stabilization of amorphous Al2O3-based thin films [Poster Presentation]. SIMS Europe 2025, Gießen, Germany. http://hdl.handle.net/20.500.12708/221107