ViennaPS: A flexible framework for semiconductor process simulation

Abstract

ViennaPS is an open-source software framework for simulating fabrication processes in semiconductor manufacturing, with a focus on topography evolution during etching and deposition. It uses a high-performance level-set method with a hierarchical run-length encoding data structure for efficient and fast geometry representation and evolution. ViennaPS supports both analytical and physics-based process models, including Monte Carlo ray tracing for flux calculation at the feature scale. Designed for flexibility and extensibility, it enables users to prototype new models or apply pre-configured ones. ViennaPS provides a customizable platform for researchers and engineers developing advanced process simulations in both academic and industrial settings.