Record link: 
http://hdl.handle.net/20.500.12708/30045
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Title: 
Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review
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Citation: 
Klemenschits, X., Selberherr, S., & Filipovic, L. (2019). Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review. Micromachines, 105–135. http://hdl.handle.net/20.500.12708/30045
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Publication Type: 
Article - Review Article
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Language: 
English
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Authors: 
Klemenschits, Xaver 
Selberherr, Siegfried 
Filipovic, Lado 
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Organisational Unit: 
E360 - Institut für Mikroelektronik 
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Journal: 
Micromachines 
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ISSN: 
2072-666X
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Date (published): 
2019
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Number of Pages: 
31
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Publisher: 
MDPI
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Peer reviewed: 
Yes
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Keywords: 
technology computer-aided design (TCAD); metal oxide semiconductor field effect transistor (MOSFET); topography simulation; metal gate stack; level set; high-k; fin field effect transistor (FinFET)
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Additional information: 
Special Issue Miniaturized Transistors (DOI: 10.3390/books978-3-03921-011-4)
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Research Areas: 
Modeling and Simulation: 50%
Computational System Design: 50%
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Science Branch: 
Elektrotechnik, Elektronik, Informationstechnik
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