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Record link: 
http://hdl.handle.net/20.500.12708/89859
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Title: 
ALD of high-k oxides on (100) Ge-substrates: Scaling ability and interface engineering for MOS-device applications
en
Citation: 
Bethge, O., Abermann, S., Henkel, C., Straif, C., Hutter, H., Smoliner, J., & Bertagnolli, E. (2010). ALD of high-k oxides on (100) Ge-substrates: Scaling ability and interface engineering for MOS-device applications. Baltic ALD 2010 & GerALD2, Hamburg,Deutschland, EU. http://hdl.handle.net/20.500.12708/89859
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Publication Type: 
Presentation - Conference Presentation
en
Language: 
English
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Authors: 
Bethge, Ole 
Abermann, Stephan 
Henkel, Christoph 
Straif, C 
Hutter, H. 
Smoliner, Jürgen 
Bertagnolli, Emmerich 
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Organisational Unit: 
E362 - Institut für Festkörperelektronik 
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Date (published): 
2010
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Event name: 
Baltic ALD 2010 & GerALD2 
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Event date: 
16-Sep-2010 - 17-Sep-2010
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Event place: 
Hamburg,Deutschland, EU
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Science Branch: 
Elektrotechnik, Elektronik
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Appears in Collections:
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