Title Titel
Thin Solid Films
 
e-ISSN
1879-2731
 
ISSN
0040-6090
 
Publisher Herausgeber
ELSEVIER SCIENCE SA
 
Publisher's Address Herausgeber Adresse
PO BOX 564, LAUSANNE, SWITZERLAND, 1001
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Date Issued:  [2000 TO 2024]

Results 21-40 of 48 (Search time: 0.003 seconds).

PreviewAuthor(s)TitleTypeIssue Date
21Riedl, H. ; Koller, C.M. ; Munnik, F. ; Hutter, H. ; Mendez Martin, F. ; Rachbauer, R. ; Kolozsvári, S. ; Bartosik, M. ; Mayrhofer, P.H. Influence of oxygen impurities on growth morphology, structure and mechanical properties of Ti-Al-N thin filmsArtikel Article 2016
22Lazar, Petr ; Rashkova, Boriana ; Redinger, Josef ; Podloucky, Raimund ; Mitterer, Christian ; Scheu, Christina ; Dehm, Gerhard Interface structure of epitaxial (111) VN films on (111) MgO substratesArtikel Article 2008
23Eisenmenger-Sittner, Christoph ; Bangert, Herwig ; Joo, Hyun Youn ; Barna, Peter B. ; Kovács, A. Lamellar growth in sputter-deposited aluminum-tin-aluminum sandwich layersArtikel Article2005
24Gall, S. ; Schneider, J. ; Klein, J. ; Hübener, K. ; Muske, M. ; Rau, B. ; Conrad, E. ; Sieber, I. ; Petter, K. ; Lips, K. ; Stöger-Pollach, M. ; Schattschneider, P. ; Fuhs, W. Large-grained polycrystalline silicon on glass for thin-film solar cellsArtikel Article2006
25Bohnenberger, Timo ; Schmid, Ulrich Layer-by-layer approach for deposition of pure carbon nanotubes and composite films for use as electrodes in electrochemical devicesArtikel Article2014
26Illarionov, Yu.Yu. ; Vexler, M.I. ; Fedorov, V.V. ; Suturin, S.M. ; Sokolov, N.S. Light Emission from the Au/CaF2/p-Si(111) Capacitors: Evidence for an Elastic Electron Tunneling Through a Thin (1-2 nm) Fluoride LayerArtikel Article2013
27Bethge, Ole ; Abermann, Stephan ; Henkel, Christoph ; Bertagnolli, Emmerich Low temperature atomic layer deposition of high-k dielectric stacks for scaled metal-oxide-semiconductor devicesArtikel Article2009
28Frischmuth, Tobias ; Schneider, Michael ; Bogdanović Radović, Iva ; Siketić, Zdravko ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich Lowtemperature deposition of a-SiC:H thin films applying a dual plasma source processArtikel Article 2016
29Dergez, D. ; Schneider, M. ; Bittner, A. ; Schmid, U. Mechanical and electrical properties of DC magnetron sputter deposited amorphous silicon nitride thin filmsArtikel Article2015
30Dergez, D. ; Schneider, M. ; Bittner, A. ; Pawlak, N. ; Schmid, U. Mechanical and electrical properties of RF magnetron sputter deposited amorphous silicon-rich silicon nitride thin filmsArtikel Article 2016
11Grosser, Michaela ; Seidel, Helmut ; Schmid, Ulrich Microstructure and Mechanical Properties of Sputter Deposited Tantalum Nitride Thin Films after High Temperature LoadingArtikel Article 2017
12Stüber, M. ; Riedl, H. ; Wojcik, T. ; Ulrich, S. ; Leiste, H. ; Mayrhofer, P.H. Microstructure of Al-containing magnetron sputtered TiB2 thin filmsArtikel Article 2019
13Koch, T. ; Evaristo, M. ; Pauschitz, A. ; Roy, Manish ; Cavaleiro, A. Nanoindentation and nanoscratch behaviour of reactive sputtered deposited W-S-C filmArtikel Article2009
14Mathur, Sanjay ; Sivakov, Vladimir ; Shen, H. ; Barth, Sven Christian ; Cavelius, Christian ; Nilsson, Andreas ; Kuhn, Patrick Nanostructured films of iron, tin and titanium oxides by chemical vapour depositionArtikel Article 28-Apr-2006
15Triendl, F. ; Pfusterschmied, G. ; Fleckl, G. ; Schwarz, S. ; Schmid, U. On the crystallization behavior of sputter-deposited a-Si films on 4H-SiCArtikel Article 2020
16Dalbauer, V. ; Ramm, J. ; Kolozsvári, S. ; Koller, C.M. ; Mayrhofer, P.H. On the phase evolution of arc evaporated Al-Cr-based intermetallics and oxidesArtikel Article 2017
17Franz, R. ; Schnöller, J. ; Hutter, H. ; Mitterer, C. Oxidation and diffusion study on AlCrVN hard coatings using oxygen isotopes ¹⁶O and ¹⁸OArtikel Article2011
18Stöger-Pollach, M. ; Walter, T. ; Muske, M. ; Gall, S. ; Schattschneider, P. Phase transformations of an alumina membrane and its influence on silicon nucleation during the aluminium induced layer exchangeArtikel Article2007
19Stöger-Pollach, Michael ; Walter, Thomas ; Muske, M ; Gall, S ; Schattschneider, Peter Phase transformations of an alumina membrane and its influence on silicon nucleation during the aluminium induced layer exchangeArtikel Article2007
20Gablech, Imrich ; Svatoš, Vojtěch ; Caha, Ondřej ; Dubroka, Adam ; Pekárek, Jan ; Klempa, Jaroslav ; Neužil, Pavel ; Schneider, Michael ; Šikola, Tomáš Preparation of high-quality stress-free (001) aluminum nitride thin film using a dual Kaufman ion-beam source setupArtikel Article 2019