Record link: 
http://hdl.handle.net/20.500.12708/174374
-
Title: 
Simulation of Critical IC Fabrication Processes Using Advanced Physical and Numerical Methods
en
Citation: 
Jüngling, W., Pichler, P., Selberherr, S., Guerrero, E., & Pötzl, H. (1985). Simulation of Critical IC Fabrication Processes Using Advanced Physical and Numerical Methods. IEEE Transactions on Electron Devices, 32(2), 156–167. https://doi.org/10.1109/t-ed.1985.21925
-
Publisher DOI: 
10.1109/t-ed.1985.21925
-
Publication Type: 
Artikel - Original Research Article
de
 
Article - Original Research Article
en
Language: 
English
-
Authors: 
Jüngling, Werner 
Pichler, P. 
Selberherr, Siegfried 
Guerrero, E. 
Pötzl, Hans 
-
Organisational Unit: 
E366 - Institut für Sensor- und Aktuatorsysteme 
E360 - Institut für Mikroelektronik 
-
Journal: 
IEEE Transactions on Electron Devices 
-
ISSN: 
0018-9383
-
Date (published): 
1985
-
Number of Pages: 
12
-
Peer reviewed: 
Yes
-
Keywords: 
Electrical and Electronic Engineering; Electronic, Optical and Magnetic Materials
-
Science Branch: 
Elektrotechnik, Elektronik
-
Appears in Collections:
Article

Show full item record

Items in reposiTUm are protected by copyright, with all rights reserved, unless otherwise indicated.

Page view(s)

19
checked on Aug 5, 2023

Google ScholarTM

Check