Institut für Sensor- und Aktuatorsysteme

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Organization Name (de) Name der Organisation (de)
E366 - Institut für Sensor- und Aktuatorsysteme
 
Code Kennzahl
E366
 
Type of Organization Organisationstyp
Institute
 
Parent OrgUnit Übergeordnete Organisation
Active Aktiv
 

SubOrgUnits

Results 1-2 of 2 (Search time: 0.001 seconds).

Name
E366-01 - Forschungsbereich Mikro- und Nanosensorik
E366-02 - Forschungsbereich Mikrosystemtechnik

OrgUnit's Publications


Results 1-8 of 8 (Search time: 0.006 seconds).

PreviewAuthors / EditorsTitleTypeIssue Date
1Temperature dependency of silicon structures for magnetic field gradient sensing.pdf.jpgDabsch, Alexander; Rosenberg, Christoph; Stifter, Michael; Keplinger, FranzTemperature dependency of silicon structures for magnetic field gradient sensingArticle Artikel2017
2Switching performance of bistable membranes activated with integrated piezoelectric thin film transducers.pdf.jpgDorfmeister, M. ; Kössl, B. ; Schneider, M. ; Pfusterschmied, G. ; Schmid, U. Switching performance of bistable membranes activated with integrated piezoelectric thin film transducersArticle Artikel2019
3Stacked Layers of Different Porosity in H SiC Substrates Applying a Photoelectrochemical Approach.pdf.jpgLeitgeb, Markus R. ; Zellner, Christopher ; Hufnagl, Christoph ; Schneider, Michael ; Schwab, Stefan; Hutter, Herbert ; Schmid, UlrichStacked Layers of Different Porosity in 4H SiC Substrates Applying a Photoelectrochemical ApproachArticle Artikel2017
4Position-dependent mass responsivity of silicon MEMS cantilevers excited in the fundamental two-dimensional roof tile-shaped mode.pdf.jpgPatocka, F. ; Schneider, M.; Dörr, N. ; Schneidhofer, C. ; Schmid, U.Position-dependent mass responsivity of silicon MEMS cantilevers excited in the fundamental, two-dimensional roof tile-shaped modeArticle Artikel2019
5Metal assisted photochemical etching of H silicon carbide.pdf.jpgLeitgeb, Markus ; Zellner, Christopher ; Schneider, Michael ; Schwab, Stefan ; Hutter, Herbert; Schmid, UlrichMetal assisted photochemical etching of 4H silicon carbideArticle Artikel2017
6MEMS cantilever based magnetic field gradient sensor.pdf.jpgDabsch, Alexander; Rosenberg, Christoph ; Stifter, Michael ; Keplinger, Franz MEMS cantilever based magnetic field gradient sensorArticle Artikel2017
7Enhanced process stability for the low temperature sputter deposition of aluminium nitride thin films.pdf.jpgFischeneder, M. ; Bittner, A. ; Schneider, M.; Schmid, U.Enhanced process stability for the low temperature sputter deposition of aluminium nitride thin filmsArticle Artikel2018
8Communication -- The Role of the Metal-Semiconductor Junction in Pt-Assisted Photochemical Etching of Silicon Carbide.pdf.jpgLeitgeb, Markus; Backes, Andreas ; Schneider, Michael; Zellern, Christopher ; Schmid, UlrichCommunication — The Role of the Metal-Semiconductor Junction in Pt-Assisted Photochemical Etching of Silicon CarbideArticle Artikel2016