Record link: 
http://hdl.handle.net/20.500.12708/156362
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Title: 
Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements
en
Citation: 
Okorn-Schmidt, H. F., Holsteyns, F., Lippert, A., Mui, D., Kawaguchi, M., Lechner, C., Frommhold, P. E., Nowak, T., Reuter, F., Piqué, M. B., Cairós, C., & Mettin, R. (2014). Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements. ECS Journal of Solid State Science and Technology, 3(1), N3069–N3080. https://doi.org/10.1149/2.011401jss
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Publisher DOI: 
10.1149/2.011401jss
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Publication Type: 
Artikel - Original Research Article
de
 
Article - Original Research Article
en
Language: 
English
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Authors: 
Okorn-Schmidt, Harald F. 
Holsteyns, Frank 
Lippert, Alexander 
Mui, David 
Kawaguchi, Mark 
Lechner, Christiane 
Frommhold, Philipp E. 
Nowak, Till 
Reuter, Fabian 
Piqué, Miquel Banchs 
Cairós, Carlos 
Mettin, Robert 
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Organisational Unit: 
E322-02 - Forschungsbereich Numerische Strömungsmechanik 
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Journal: 
ECS Journal of Solid State Science and Technology 
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ISSN: 
2162-8769
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Date (published): 
Jan-2014
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Number of Pages: 
12
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Publisher: 
ELECTROCHEMICAL SOC INC
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Peer reviewed: 
Yes
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Keywords: 
Electronic, Optical and Magnetic Materials
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Research Areas: 
außerhalb der gesamtuniversitären Forschungsschwerpunkte: 40%
Surfaces and Interfaces: 50%
Modelling and Simulation: 10%
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Science Branch: 
Andere Naturwissenschaften
Sonstige Technische Wissenschaften
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