Institut für Mikroelektronik

Organization Name (de) Name der Organisation (de)
E360 - Institut für Mikroelektronik
 
Code Kennzahl
E360
 
Type of Organization Organisationstyp
Institute
Parent OrgUnit Übergeordnete Organisation
 
Active Aktiv
 

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Results 181-200 of 715 (Search time: 0.005 seconds).

PreviewAuthor(s)TitleTypeIssue Date
181Grill, A. ; Stampfer, B. ; Im, Ki-Sik ; Lee, J.-H. ; Ostermaier, C. ; Ceric, H. ; Waltl, M. ; Grasser, T. Electrostatic Coupling and Identification of Single-Defects in GaN/AlGaN Fin-MIS-HEMTsArtikel Article 2019
182Illarionov, Yury Yu ; Banshchikov, Alexander G ; Polyushkin, Dmitry K ; Wachter, Stefan ; Knobloch, Theresia ; Thesberg, Mischa ; Vexler, Mikhail I ; Waltl, Michael ; Lanza, Mario ; Sokolov, Nikolai S ; Mueller, Thomas ; Grasser, Tibor Reliability of Scalable MoS2 FETs With 2 nm Crystalline CaF2 InsulatorsArtikel Article 2019
183Ullmann, Bianka ; Jech, Markus ; Puschkarsky, Katja ; Rott, Gunnar Andreas ; Waltl, Michael ; Illarionov, Yury ; Reisinger, Hans ; Grasser, Tibor Impact of Mixed Negative Bias Temperature Instability and Hot Carrier Stress on MOSFET Characteristics-Part I: ExperimentalArtikel Article 2019
184Giering, K.-U. ; Puschkarsky, K. ; Reisinger, H. ; Rzepa, G. ; Rott, G. ; Vollertsen, R. ; Grasser, T. ; Jancke, R. NBTI Degradation and Recovery in Analog Circuits: Accurate and Efficient Circuit-Level ModelingArtikel Article 2019
185Berens, Judith ; Pobegen, Gregor ; Eichinger, Thomas ; Rescher, Gerald ; Grasser, Tibor Cryogenic Characterization of NH₃ Post Oxidation Annealed 4H-SiC Trench MOSFETsArtikel Article 2019
186Woerle, Judith ; Šimonka, Vito ; Müller, Elisabeth ; Hössinger, Andreas ; Sigg, Hans ; Selberherr, Siegfried ; Weinbub, Josef ; Camarda, Massimo ; Grossner, Ulrike Surface Morphology of 4H-SiC After Thermal OxidationArtikel Article 2019
187Sadi, Toufik ; Medina-Bailon, Christina ; Nedjalkov, Mihail ; Lee, Jaehyun ; Badami, Oves ; Berrada, Salim ; Carillo-Nunez, Hamilton ; Georgiev, Vihar ; Selberherr, Siegfried ; Asenov, Asen Simulation of the Impact of Ionized Impurity Scattering on the Total Mobility in Si Nanowire TransistorsArtikel Article 2019
188Puschkarsky, Katja ; Reisinger, Hans ; Rott, Gunnar Andreas ; Schlünder, Christian ; Gustin, Wolfgang ; Grasser, Tibor An Efficient Analog Compact NBTI Model for Stress and Recovery Based on Activation Energy MapsArtikel Article 2019
189Jing, Xu ; Illarionov, Yury ; Yalon, Eilam ; Zhou, Peng ; Grasser, Tibor ; Shi, Yuanyuan ; Lanza, Mario Engineering Field Effect Transistors with 2D Semiconducting Channels: Status and ProspectsArtikel Article 2019
190Kittler, Martin ; Reiche, Manfred ; Schwartz, Bernhard ; Uebensee, Hartmut ; Kosina, Hans ; Stanojevic, Zlatan ; Baumgartner, Oskar ; Ortlepp, Thomas Transport of Charge Carriers along Dislocations in Si and GeArtikel Article 2019
191Ruch, Bernhard ; Pobegen, Gregor ; Rösch, Maximilian ; Vytla, Rajeev Krishna ; Grasser, Tibor Charge Pumping of Low-Voltage Silicon Trench Powers MOSFETsArtikel Article 2019
192Gnam-2018-Micromachines-vor.pdf.jpgGnam, Lukas ; Manstetten, Paul ; Hössinger, Andreas ; Selberherr, Siegfried ; Weinbub, Josef Accelerating Flux Calculations Using Sparse SamplingArticle Artikel Nov-2018
193Strand, Jack ; Moloud, Kaviani ; Gao, David ; El-Sayed, Al-Moatasem Bellah ; Afanas´Ev, V. ; Shluger, A.L. Intrinsic Charge Trapping in Amorphous Oxide Films: Status and ChallengesArtikel Article 15-May-2018
194Pakdel-2018-Beilstein Journal of Nanotechnology-vor.pdf.jpgPakdel, Sahar ; Pourfath, Mahdi ; Palacios, J. J. An implementation of spin-orbit coupling for band structure calculations with Gaussian basis sets: Two-dimensional topological crystals of Sb and BiArticle Artikel 28-Mar-2018
195Simonka, Vito ; Hössinger, Andreas ; Weinbub, Josef ; Selberherr, Siegfried Empirical Model for Electrical Activation of Aluminum- and Boron-Implanted Silicon CarbideArtikel Article 4-Jan-2018
196Filipovic Lado - 2018 - Review--System-on-Chip SMO Gas Sensor Integration in...pdf.jpgFilipovic, Lado ; Lahlalia, Ayoub Review—System-on-Chip SMO Gas Sensor Integration in Advanced CMOS TechnologyArticle Artikel Jan-2018
197Kampl Markus - 2018 - The Backward Monte Carlo Method for Semiconductor Device...pdf.jpgKampl, Markus ; Kosina, Hans The Backward Monte Carlo Method for Semiconductor Device SimulationArticle Artikel 2018
198Kaczer, B. ; Franco, J. ; Weckx, P. ; Roussel, Ph.J. ; Putcha, V. ; Bury, E. ; Simicic, M. ; Chasin, A. ; Linten, D. ; Parvais, B. ; Catthoor, F. ; Rzepa, G. ; Waltl, M. ; Grasser, T. A Brief Overview of Gate Oxide Defect Properties and Their Relation to MOSFET Instabilities and Device and Circuit Time-Dependent VariabilityArtikel Article 2018
19Rzepa, G. ; Franco, J. ; O’Sullivan, B. ; Subirats, A. ; Simicic, M. ; Hellings, G. ; Weckx, P. ; Jech, M. ; Knobloch, T. ; Waltl, M. ; Roussel, P.J. ; Linten, D. ; Kaczer, B. ; Grasser, T. Comphy -- A Compact-Physics Framework for Unified Modeling of BTIArtikel Article 2018
20Tyaginov, S. E. ; Makarov, A. A. ; Jech, M. ; Vexler, M. I. ; Franco, J. ; Kaczer, B. ; Grasser, T. Physical Principles of Self-Consistent Simulation of the Generation of Interface States and the Transport of Hot Charge Carriers in Field-Effect Transistors Based on Metal-Oxide-Semiconductor StructuresArtikel Article 2018